Education

Education

Masters of Business Administration (4.0 GPA)
University of Florida, Gainesville, FL | 2006

Master of Science (3.94 GPA), Industrial and Systems Engineering
University of Florida, Gainesville, FL | 2006

(Note: RAVE does not have an awards program)

Community Service

Hugs not Drugs Haunted House, 2003 and 2005
Donor to multiple charities - primarily Leukemia Society, American Cancer Society and State Troopers Association.
Participate in various 5k's and fundraisers such as Relay for Life, Mercedes Benz Corporate Run, and so on

Computer Skills

Project Management, >>40h
Extensive statistics, variance analysis, SPC, and DOE training
Negotiation for Mutual Gain
Extensive root cause analysis training (8D, FRACUS, Intel 7 step problem solving)
Cost of Ownership modeling
Covey’s 7 Habits, Carnegie’s How to Win Friends, Franklin Time Management
Kiki: the Art of Working with the Japanese
Over 50 other corporate training courses

U.S. Patent 7,495,240 titled, "Apparatus and Method for Modifying an Object," Hopkins, Ray, LeClaire, White, (issued)

 U.S. Patent 7,323,699 titled, "Apparatus and Method for Modifying an Object," Hopkins, Ray, LeClaire, White, (issued)

Eight patents pending, as well as several invention disclosures on file with RAVE LLC

1.“Qualification of BitClean™ Technology in Photomask Production,” Tod Robinson, Roy White, Ron Bozak, Mike Archuletta, David Brinkley, Daniel Yi, SEMATECH Mask Cleaning Workshop, September 27, 2010

2.“Advanced Laser Mask Repair in the Current Wafer Foundry Environment,” Tod Robinson, Daniel Yi, Jeff LeClaire, Roy White; Ron Bozak; Mike Archuletta, SPIE Photomask Technology Conference, September 20, 2010

3.“Qualification of BitClean™ Technology in Photomask Production,” Tod Robinson, Roy White, Ron Bozak, Mike Archuletta, David Brinkley, Daniel Yi, SPIE Photomask Technology Conference, September 20, 2010

4.“Through-Pellicle Defect Repair for Advanced Photomasks,” Tod Robinson, Roy White, Ron Bozak, Jeff LeClaire, Mike Archuletta, David Lee, Photomask Japan, April 13, 2010

5.“Preliminary Results for Photomask Haze Mitigation in a Fab Environment,” Thomas Ku, Jeff LeClaire, Sia Kim Tan, Gek Soon Chua, Ron Bozak, Roy White, Tod Robinson, Mike Archuletta, David Lee, Photomask Japan, April 13, 2010

6.“Nanomachining of Non-Orthogonal  Mask Patterns,” (poster) Tod Robinson, Daniel Yi, David Brinkley, Roy White, Ron Bozak, Mike Archuletta, David Lee, Photomask Japan, April 13, 2010

7.“Preliminary Results for Photomask Haze Mitigation in a Fab Environment,” Thomas Ku, Jeff LeClaire, Sia Kim Tan, Gek Soon Chua, Ron Bozak, Roy White, Tod Robinson, Mike Archuletta, David Lee, SPIE Lithography, February 24, 2010

8.“New Tools to Enable Photomask Repair to the 32 nm Node,” Tod Robinson, Roy White, Ron Bozak, Ken Roessler, Bernie Arruza, Dennis Hogle, Mike Archuletta, David Lee, SPIE Photomask Technology, September 23, 2009

9. “Selective Removal of Persistent Particles with No Photomask Damage,” Tod Robinson, Ron Bozak, Roy White, Mike Archuletta, David Lee, Photomask Japan, April 9, 2009

10.  “Nanomachining Photomask Repair of Complex Patterns,” Tod Robinson, Andrew Dinsdale, Mike Archuletta, Ron Bozak, Roy White, SPIE Photomask Technology, October 17, 2008

11.  “Practical Laser Mask Repair in the Contemporary Production Environment,”  Tod Robinson, Roy White, Mike Archuletta, Ron Bozak, SPIE Photomask Technology, October 17, 2008

12.  “Nanomachining processes for 45, 32 nm node mask repair-and beyond,” Tod Robinson, Andrew Dinsdale, Ron Bozak, Roy White, Michael Archuletta, Photomask Japan, April 17, 2008

13.  “Yield at any Cost,” Roy White, Solid State Technology (print and online), Feb. 2008, http://www.electroiq.com/index/display/semiconductors-article-display/319282/articles/solid-state-technology/feature-articles/2008/02/centerfebruary-2008-exclusive-feature-1br-yield-at-any-cost-center.html#1:--Yield-at-any-cost-/

14.  “Repairing 45 nm Node Defects Through Nano-machining,” D. Brinkley, R. White, A. Dinsdale, T. Robinson, J. Csuy, D. Lee, SPIE Photomask Technology Conference, September 18, 2007

15.  “Precise and High-throughput Femtopulse Laser Mask Repair of Large Defects,” R. White, J. LeClaire, T. Robinson, A. Dinsdale, R. Bozak, D. Lee, SPIE Photomask Technology Conference, September 18, 2006

16.  “Femtopulse Laser-based Mask Repair in the DUV-wavelength Regime,” F. Ghadiali, V. Tolani, R. Nagpal, T. Robinson, J. LeClaire, R. White, R. Bozak, D. Lee, Photomask Japan, Yokohama, Japan, April 18, 2006

17.  “Laser Mask Repair for Advanced Technologies,” Andrew Dinsdale, Tod Robinson, Jeff LeClaire, Roy White, Ron Bozak, David A. Lee, European Mask Lithography Conference, Dresden, Germany, January 25, 2006

18.  “Mask Repair for the 65 nm Technology Node,” Tod Robinson, Andrew Dinsdale, Ron Bozak, Roy White, David A. Lee, SPIE Photomask Technology Conference, September 2005

19.  “The Challenges of Building a 45 nm Photomask Repair Tool,” Roy White, SEMICON Japan, December 2004

20.  “Inspection and repair issues for step and flash imprint lithography templates,” K. Nordquist, D. Mancini, W. Dauksher, D. Resnick, H. Hess, D. Pettibone, D. Adler, K. Bertsche, R. White, J. E. Csuy, D. Lee, Bay Area Chrome User’s Society Symposium, September 2004

21.  “Repair of Step and Flash Imprint Lithography Templates,” W. Dauksher, K. Nordquist, D. Mancini, D. Resnick, R. Bozak, R. White, J. Csuy, and D. Lee, Electron, Ion, and Particle Beam Nanofabrication Symposium, May 2004

22.  “Correlation of Inspection Methods in Characterizing Nanomachined Photomask Repairs,”  Jeffrey Csuy, Ronald Bozak, Lee Terrill, Roy White, Naoki Nishida, published at Photomask Japan, April 2004

23.  “Defect Repair Performance Using the Nanomachining Repair Technique” with Yasutaka Morikawa of Dai Nippon Printing, et. al., published in Photomask Bay Area Chrome User’s Society News, October 2003, Vol 19 Issue 10

24.  “AAPSM Repair by Nanomachining” with Yasutaka Morikawa of Dai Nippon Printing, et. al., published in Solid State Technology, September 2003

25.  “Optimization of Nanomachining Repair Conditions for ArF Lithography” with Tsuyoshi Amano of Dai Nippon Printing et. al., published at Bay Area Chrome User’s Society Symposium, September 2003

26.  “Addressing Mask Costs” w/ Dave Lee (RAVE)and Brian Grenon (Grenon Consulting) Solid State Technology, June 2003

27.  “Study of Defect Repair Performance Using the Nanomachining Repair Technique” (poster) with Yasutaka Morikawa of Dai Nippon Printing, et. al., Won best poster paper at Photomask Japan, April 2003

28.  “Use of Nanomachining for 100 Nanometer Mask Repair,” Bob LoBianco, Roy White, Ted Nawrocki, European Mask Conference January 2003

29.  “Investigation of Nanomachining as a Technique for Geometry Reconstruction,” David Brinkley, Ron Bozak, Bin Chiu, Chanh Ly, Vikram Tolani, and Roy White, Bay Area Chrome User’s Society Symposium, October 2002

30.  “Nanomachining for 100 nanometer mask repair,” B. LoBianco, R. White, Bay Area Chrome User’s Society Symposium, October 2002

31.  “Use of Nanomachining for Subtractive Repair of EUV and Other Challenging Mask Defects” with David Brinkley of Intel Corporation, et. al., published at Advanced Reticle Symposium, April 2002

32.  “Use of Nanomachining for Subtractive Repair of EUV and Other Challenging Mask Defects” with David Brinkley of Intel Corporation, et. al., published at Photomask Japan, April 2002

33.  “High Precision Mask Repair Using Nanomachining” with Martin Verbeek of Infineon Technologies, et. al., published at the European Mask Conference, January 2002

34.  “Use of Nanomachining as a Technique to Reduce Scrap of High End Photomasks” with Martin Verbeek of Infineon Technologies, et. al., published at Bay Area Chrome Users Society conference, October 2001

35.  “A Study on Edge Placement Accuracy of Opaque and Clear Defect Repairs Using Focused Ion Beam Technology” with Mark Raphaelian (Micrion Corporation) et al published at Bay Area Chrome Users Society conference in Sept. 1997